Specially processed mixed resins for high purity applications such as pharmaceutical and semiconductor rinse applications. Semiconductor and microelectronic grades that minimize leachable TOC, sodium, and other contaminants are available.
DuPont Resin AmberLite HPR900 (OH) anion [7CF] 99113868. Fully compatible drop-in replacement for AMBERSEP™ 900 OH, 10039263.
DuPont Resin AmberTec MR-300 UPW (H/OH) MB [5CF] 12018715 is an ultrapure water-grade, mixed resin recommended as a working or polishing mixed bed to complement 2-bed ion exchange or reverse osmosis systems. For DOWEX™ Monosphere™ MR-3 UPW H/OH, 128382.
DuPont Resin AmberTec MR-450 UPW (H/OH) MB [5CF] 12018716 is an ultrapure water-grade, non-separable, homogeneous, mixed bed resin recommended as a point-of-use or nonregenerable mixed bed in the polishing loop to achieve sub-ppb levels of soluble silica, boron, sodium, potassium, sulfate, chloride, zinc, iron, and aluminum. This nonregenerable mixed bed resin is used for 2 – 3 years before replacement. For DOWEX™ Monosphere™ MR-450 UPW H/OH, 129795.
DuPont Resin AmberTec UP6040 (H/OH) MB [7 CF] 12018796 is a mixture of semiconductor-grade, extremely high purity, uniform particle size, gel, strong acid cation and strong base anion exchange resins. For AMBERJET™ UP6040, 10031265. AmberTec UP6040 H/OH mixed bed resin is intended for use as a final polishing step in the production or ultrapure water.
DuPont Resin AmberTec UP6150 (H/OH) MB [7 CF] 12018803 is a mixture of uniform particle size, gel, strong acid cation and strong base anion exchange resins. For AMBERJET™ UP6150, 10031407.
DuPont Resin AmberTec UP650 (H) CATION [5 CF] 12018711 is a premiumquality, high-capacity, uniform particle size strong acid cation resin designed specifically for use in regenerable mixed beds when highest resin purity and water quality are required. For DOWEX™ Monosphere™ 650C UPW H, 124125.
Evoqua NR-30 PPQ is a 1:1 chemical equivalent of C-361 MEG PPQ (H) and A-464 MEG PPQ (OH). These resins are produced using selected starting resins meeting Evoqua specifications and are processed to have very low TOC leachables, boron, and dynamic sodium levels for use in the semiconductor market. They also offer very quick rinse up.
Evoqua NR-30 MEG is a 1:1 chemical equivalent of C-361 MEG (H) and A-464 MEG (OH). C-361 MEG (H) is a 10% cross-linked gel strong acid cation exchange Resin. A-464 MEG (OH) is a Type I porous strong base gel anion Resin. C-361 MEG (H) and A-464 MEG (OH) are specially processed to provide low TOC leachables. The resins are checked kinetically to produce 18+ megohm resistivity and provide excellent mixed bed separation.
DuPont Resin AmberLite IRN150 (H/OH) [7CF] 99114391 is a Mixture of Nuclear-grade, Uniform Particle Size, Gel, Strong Acid Cation and Strong Base Anion Exchange Resins for Water Treatment Applications in the Nuclear Power Industry. Fully compatible: drop-in replacement for AmberLite IRN150, 10040398.
DuPont Resin AmberLite IRN160 (H/OH) [7CF] 99114392. Fully compatible: drop-in replacement for AmberLite IRN160, 10040404.
