Description

Semiconductor manufacturing technology requirements have surpassed the capabilities of particle metrology and removal technologies to meet the needs of measuring and controlling particles in Ultrapure Water (UPW) used on wafer surfaces and mask cleaning.

The pores size of conventional filtration technology employed as final filters in UPW systems are close to, if not larger than, the critical size causing so-called "killer" defects. While current semiconductor manufacturing is approaching 10nm and smaller geometries, the ability of the final filters to reduce these killer particles is not fully understood. No matter how clean a UPW system is perceived to be, components such as piping, valves and non-steady state operating conditions will generate or release particles throughout the UPW system, ultimately contaminating the distribution loop and the tools.

Evoqua's solution - the Vanox® POU-F System - is a compact, ultra clean, point of use filtration system designed to remove particles from water feeding the critical clean tools used for semiconductor fabrication. Leveraging over a decade of providing ultra-clean Vanox systems into the most demanding immersion lithography space, the POU-F improves upon the particle removal technology to deliver the solution to the rest of the fab.

The Vanox POU-F system is constructed with validated materials and technology to ensure optimal particle reduction. The POU-F efficiently removes particles that can cause yield and performance loss while extending the run time of the Wets/Cleans equipment between preventive maintenance activities.